Partha ChaudhuriProfessor
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| 1. | "Argon assisted plasma CVD of amorphous
silicon carbide films",
Partha Chaudhuri and Ujjwal Kumar Das: Jpn. J. Appl. Phys., Part 2, Letters, v.36, p. L1426 (1997). |
| 2. | "Optical emission spectroscopic
study of a radio frequency plasma of Ar+SiH4",
U. K. Das and P. Chaudhuri : Chemical Physics Letters, v. 298, 211-216 (1998) |
| 3. | "The results of the PEP'93 intercomparison
of reference cell calibrations and newer technology performance measurements:
Final report",
C. R. Osterwald, S. Anevsky, A. K. Barua, K. Bucher, P. Chaudhuri, J. Dubard, K. Emery, D. King, B. Hansen, J. Metzdorf, F. Nagamine, R. Shimokawa, Y. X. Wang, T. Wittchen, W. Zaaiman, A. Zastrow and J. Zhang, National renewable Energy Laboratory (U.S.A.) Report Number TP-520-23477 (March 1998) |
| 4. | "Correlation of Nanostructural
Heterogeneity and Light Induced Degradation in a-Si:H Solar Cells",
Ujjwal Kumar DAS, Jatindra Kumar RATH, Don L. WILLIAMSON and Partha CHAUDHURI: Jpn. J. Appl. Phys., Vol.39 (2000) No.5A |